Jim WileyTransparent backside coating of EUV masks for laser correction to improve on-product-overlaySPIE Photomask Technology 2017 Best Poster Award WinnerNov 29, 2017Nov 29, 2017
Jim WileyEUVL vs. NIL: Why aren’t we done yet?BACUS Newsletter Editorial — July 2017 Artur Balasinski, Cypress Semiconductor Corp.Jul 11, 2017Jul 11, 2017
Jim WileyLooking forward to the day that we can take EUV masks for grantedJim Wiley, BACUS PresidentJun 24, 2017Jun 24, 2017
Jim WileyActinic Patterned Mask Inspection Panel SPIE EUVL Symposium + Photomask TechEmily Gallagher, IMEC Peter Buck, Mentor Graphics Corp.Jun 23, 2017Jun 23, 2017
Jim WileyTowards a stand-alone high-throughput EUV actinic photomask inspection tool — RESCANRESCAN uses Scanning Scattering Contrast Microscopy (SSCM) and Scanning Coherent Diffraction Imaging (SCDI) for fast defect detection and…Jun 22, 2017Jun 22, 2017
Jim WileySPIE Photomask and EUVL Symposia Converge — BACUS News EditorialActinic Mask Inspection Panel AnnouncedJun 22, 2017Jun 22, 2017
Jim WileyMaskmaking — 50 Years of HistoryEnabling Moore’s Law Will Continue with EUVMay 5, 2017May 5, 2017