Figure 11. COSAMI: COmpact Source Actinic Mask Inspection. 100mW of actinic power with a relatively small footprint.

Towards a stand-alone high-throughput EUV actinic photomask inspection tool — RESCAN

RESCAN uses Scanning Scattering Contrast Microscopy (SSCM) and Scanning Coherent Diffraction Imaging (SCDI) for fast defect detection and accurate defect localization.

With extreme ultraviolet (EUV) lithography getting ready to enter high volume manufacturing, there is an imminent need to address EUV mask metrology infrastructure. Actinic defect inspection of patterned EUV photomasks has been identified as an essential step for mask qualification, but there is no commercial tool available right now. We address this gap with the RESCAN tool, a defect inspection platform being built at Paul Scherrer Institute (PSI), co-developed in collaboration with NuFare Inc, Japan. RESCAN uses Scanning Scattering Contrast Microscopy (SSCM) and Scanning Coherent Diffraction Imaging (SCDI) for fast defect detection and accurate defect localization.

Read the details in the June 2017 BACUS Newsletter:
https://spie.org/Documents/Membership/BacusNewsletters/BACUS-Newsletter-June-2017.pdf

Show your support

Clapping shows how much you appreciated Jim Wiley’s story.