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EUV Integration at 5nm Still Risky, With Major Problems to Solve

by Joel Hruska

Semiconductor foundries are pushing ahead with extreme ultraviolet lithography (EUV) integration, but there are still formidable barriers to deploying the technology at 5nm and below.

There are several problems that EUV must solve (or continue solving) in order to serve as a replacement for existing 193nm…

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